ACM Research Enhances Single-Wafer Hot SPM System with Sulfuric Acid Recycle Capability
Key Highlights
- ➤70% sulfuric acid recycle rate achieved while maintaining customer-specified particle control
- ➤Approximately 400 tons of sulfuric acid saved annually per tool
- ➤Customer validation completed across more than 50 process layers
- ➤Particle counts of 15 or fewer at 15 nm and above
- ➤ACM Research (ACMR) enhanced its 170°C Single-Wafer Hot SPM system
Expert Statements
Dr. David Wang, President and Chief Executive Officer of ACM Research
“As semiconductor manufacturing becomes more complex, customers need technologies that can meet increasingly demanding process requirements while improving manufacturing efficiency”
Dr. David Wang, President and Chief Executive Officer of ACM Research
“The continued advancement and customer validation of our Single-Wafer Hot SPM platform demonstrates ACM’s commitment to differentiated innovation and our ability to deliver solutions that address the evolving needs of semiconductor manufacturers.”
FREMONT, Calif., Oct. 21, 2026 (GLOBE NEWSWIRE) -- ACM Research, Inc. (“ACM”) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced packaging applications, today announced an enhanced version of its 170°C Single-Wafer Hot Sulfuric Peroxide Mixture (“SPM”) system featuring a new sulfuric acid recycle capability. The system has been validated by a foundry customer across more than 50 process layers, demonstrating its ability to support a broad range of cleaning applications.
ACM’s Single-Wafer Hot SPM system achieves particle counts of 15 or fewer at 15 nm and above, significantly outperforming mainstream market solutions. Unlike conventional systems that require periodic deionized (“DI”) water rinsing to remove crystalline deposits caused by acid mist during hot SPM processing, ACM’s proprietary nozzle design effectively prevents such contamination, enabling stable cleaning performance without periodic DI water chamber cleaning. This design can help improve yields in both logic and memory applications while reducing equipment maintenance requirements.
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